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Harvard Researchers Select Award Winning 125kV Electron Beam Lithography System
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Category: Annoucements
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Published on Tuesday, 24 May 2011 06:18
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Written by Administrator
Elionix Inc., a world leader in electron beam lithography, announces a second order placed by Harvard's Center for Nanoscale Systems for the Elionix ELS-F125 electron beam lithography system.
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The 125kV Elionix electron beam lithography system will become part of the National Science Foundation's National Nanotechnology Infrastructure Network (NNIN), located at Harvard's Center for Nanoscale Systems (CNS). |
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Elionix Wins Nano Tech 2010 Award
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Category: Annoucements
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Published on Monday, 14 July 2008 07:06
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Written by Administrator
World’s Finest Electron Beam Lithography System The Elionix ELS-F125 is the only Electron Beam Lithography (EBL) system in the world to guarantee fabrication of 5 nanometer linewidths. NORTH BILLERICA, MA, February 28, 2010 – Elionix, Inc. was recently awarded the distinguished Micro/Processing Technology and Equipment Prize at Nano Tech 2010 held in Tokyo, Japan. The annual Nano Tech award ceremony was held on Friday, February 19th. The award goes to exceptional exhibitors of innovative and pioneering technology or products.
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