The ELS-BODEN 150

ELS-BODEN 100

Key Features:

  • Generates patterns with a minimum line width of 6nm
  • Stable 1.8nm electron beam using high beam current at 100kV
  • A 20bit DAC provides high beam positioning resolution
  • At a beam current of 1nA, 20nm lines can be written over an entire 500μm field without stitching

HIGH PERFORMANCE 100 KV LITHOGRAPHY SYSTEM

The ELS-BODEN 100 is the standard when it comes to common applications and a wide variety of requirements. It can accommodate samples from small pieces all the way up to 12” (300mm) wafers and 9” masks. The ELS-BODEN 100 produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine patterns to be drawn with a line width of 6nm or less.

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Specification

Electron Gun

Acceleration voltage

Beam current

Min. beam spot size

Writing field size

Min. / Max. field size

Scan clock

Min. beam position

Max. sample size

Max.writing area

Loading system

Software

ZrO/W Thermal Field Emitter

50kV

100kV

125kV

150kV

1nA
~800nA

20pA
~100nA

5pA
~100nA

5pA
~100nA

2.8nm

1.8nm

1.7nm

1.5nm

1000µm

1000um

500µm

500µm

Min 100µm square
Max (Option) 3000µm square

200MHz

0.1nm (at standard field)

8" (200mm) wafer / 12" (300mm) wafer (Option)

8" (200mm) square / 12" (300mm) square (Option)

Single autoloader
Multi autoloader
12" (300mm) FOUP robot loader
PEB robot loader

elms

elms-logo

Beam conditions
Exposure schedule
Pattern data converter
Account management
Python scripting

Website with Boden

Elionix Lithography Management System

The elms software is a comprehensive electron beam lithography management user interface residing on a Win10 platform.  From full production job scheduling, to SEM UI, to system diagnostics, this software platform is very intuitive to use.
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