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The ELS-BODEN 150

ELS-BODEN 125

Key Features:

  • 5 nm linewidth guaranteed at 125 kV
  • 1.7 nm beam diameter & minimum proximity effect at 125 kV
  • Superior large field writing:  Uniform 10 nm lines in entire 500um field
  • Small beam diameter even at high beam current; high throughput without compromising on resolution; 2 nm beam diameter at 1 nA
  • User-friendly Interface – CAD and SEM interfaces on Windows

WORLD'S FIRST 125 KV LITHOGRAPHY SYSTEM

The ELS-BODEN 125 provides the power to pattern lines down to 5nm. With it’s optional 200MHz high speed scan clock, the ELS-BODEN 125 is well suited to keep up with the pace of today’s pioneering research. It is proof of Elionix’s extensive development history and unique approach toward electron beam lithography.

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Specification

Electron Gun

Acceleration voltage

Beam current

Min. beam spot size

Writing field size

Min. / Max. field size

Scan clock

Min. beam position

Max. sample size

Max. writing area

Loading system

Software

ZrO/W Thermal Field Emitter

50kV

100kV

125kV

150kV

1nA
~800nA

20pA
~200nA

5pA
~100nA

5pA
~100nA

2.8nm

1.8nm

1.7nm

1.5nm

1000µm

1000um

500µm

500µm

Min 100µm square
Max (Option) 3000µm square

200MHz

0.1nm (at standard field)

8" (200mm) wafer / 12" (300mm) wafer (Option)

8" (200mm) square / 12" (300mm) square (Option)

Single autoloader
Multi autoloader
12" (300mm) FOUP robot loader
PEB robot loader

elms

elms-logo

Beam conditions
Exposure schedule
Pattern data converter
Account management
Python scripting

Website with Boden

Elionix Lithography Management System

The elms software is a comprehensive electron beam lithography management user interface residing on a Win11 platform.  From full production job scheduling, to SEM UI, to system diagnostics, this software platform is very intuitive to use.

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