The ELS-BODEN 150

ELS-BODEN 150

Key Features:

  • 4 nm linewidth guaranteed at 150 kV
  • 1.5 nm beam diameter and minimal proximity effect at 150 kV
  • Wider process margin than 125 kV makes it easier to fabricate advanced nanodevices
  • Single cassette auto-loader that supports 8″ wafers is standard, multi-cassette auto-loader is optional

HIGHEST ACCELERATION VOLTAGE EBL SYSTEM

The ELS-BODEN 150 is the world’s only 150kV electron beam lithography system. The ELS-BODEN 150 now offers a 300mm (12”) chamber and is the first system in the market to offer a 300mm square writing area. The ELS-BODEN 150 comes standard with a single cassette autoloader. A multiple cassette autoloader is optional. These unique features make the ELS-BODEN 150 an ideal system for advanced semiconductor research and development.

Specification

Electron Gun

Acceleration voltage

Beam current

Min. beam spot size

Writing field size

Min. / Max. field size

Scan clock

Min. beam position

Max. sample size

Max.writing area

Loading system

Software

ZrO/W Thermal Field Emitter

50kV

100kV

125kV

150kV

1nA
~1µA

20pA
~100nA

5pA
~100nA

5pA
~100nA

D5nm

D1.8nm

D1.7nm

D1.5nm

1000µm

1000um

500µm

500µm

Min 100µm square
Max (Option) 3000µm square

100MHz

0.1nm (at standard field)

8" (200mm) wafer / 12" (300mm) wafer (Option)

8" (200mm) square / 12" (300mm) square (Option)

Single autoloader
Multi autoloader
12" (300mm) FOUP robot loader
PEB robot loader

elms

Beam conditions
Exposure schedule
Pattern data converter
Account management
Python scripting

Elionix Lithography Management System

The elms software is a comprehensive electron beam lithography management user interface residing on a Win10 platform.  From full production job scheduling, to SEM UI, to system diagnostics, this software platform is very intuitive to use.