- 4 nm linewidth guaranteed at 150 kV
- 1.5 nm beam diameter and minimal proximity effect at 150 kV
- Wider process margin than 125 kV makes it easier to fabricate advanced nanodevices
- Single cassette auto-loader that supports 8″ wafers is standard, multi-cassette auto-loader is optional
HIGHEST ACCELERATION VOLTAGE EBL SYSTEM
The ELS-BODEN 150 is the world’s only 150kV electron beam lithography system. The ELS-BODEN 150 now offers a 300mm (12”) chamber and is the first system in the market to offer a 300mm square writing area. The ELS-BODEN 150 comes standard with a single cassette autoloader. A multiple cassette autoloader is optional. These unique features make the ELS-BODEN 150 an ideal system for advanced semiconductor research and development.