ELS-BODEN 150
Key Features:
- 4 nm linewidth guaranteed at 150 kV
- 1.5 nm beam diameter and minimal proximity effect at 150 kV
- Wider process margin than 125 kV makes it easier to fabricate advanced nanodevices
- Single cassette auto-loader that supports 8″ wafers is standard, multi-cassette auto-loader is optional
HIGHEST ACCELERATION VOLTAGE EBL SYSTEM
The ELS-BODEN 150 is the world’s only 150kV electron beam lithography system. The ELS-BODEN 150 now offers a 300mm (12”) chamber and is the first system in the market to offer a 300mm square writing area. The ELS-BODEN 150 comes standard with a single cassette autoloader. A multiple cassette autoloader is optional. These unique features make the ELS-BODEN 150 an ideal system for advanced semiconductor research and development.
Specification
Electron Gun
Acceleration voltage
Beam current
Min. beam spot size
Writing field size
Min. / Max. field size
Scan clock
Min. beam position
Max. sample size
Max.writing area
Loading system
Software
ZrO/W Thermal Field Emitter
50kV
100kV
125kV
150kV
1nA
~800nA
20pA
~100nA
5pA
~100nA
5pA
~100nA
2.8nm
1.8nm
1.7nm
1.5nm
1000µm
1000um
500µm
500µm
Min 100µm square
Max (Option) 3000µm square
200MHz
0.1nm (at standard field)
8" (200mm) wafer / 12" (300mm) wafer (Option)
8" (200mm) square / 12" (300mm) square (Option)
Single autoloader
Multi autoloader
12" (300mm) FOUP robot loader
PEB robot loader
elms
Beam conditions
Exposure schedule
Pattern data converter
Account management
Python scripting
Elionix Lithography Management System
The elms software is a comprehensive electron beam lithography management user interface residing on a Win10 platform. From full production job scheduling, to SEM UI, to system diagnostics, this software platform is very intuitive to use.
