ELS-BODEN 150
Key Features:
- 4 nm linewidth guaranteed at 150 kV
- 1.5 nm beam diameter and minimal proximity effect at 150 kV
- Wider process margin than 125 kV makes it easier to fabricate advanced nanodevices
- Single cassette auto-loader that supports 8″ wafers is standard, multi-cassette auto-loader is optional
HIGHEST ACCELERATION VOLTAGE EBL SYSTEM
The ELS-BODEN 150 is the world’s only 150kV electron beam lithography system. The ELS-BODEN 150 now offers a 300mm (12”) chamber and is the first system in the market to offer a 300mm square writing area. The ELS-BODEN 150 comes standard with a single cassette autoloader. A multiple cassette autoloader is optional. These unique features make the ELS-BODEN 150 an ideal system for advanced semiconductor research and development.
Specification
Electron Gun
Acceleration voltage
Beam current
Min. beam spot size
Writing field size
Min. / Max. field size
Scan clock
Min. beam position
Max. sample size
Max.writing area
Loading system
Software
ZrO/W Thermal Field Emitter
50kV
100kV
125kV
150kV
1nA
~800nA
20pA
~100nA
5pA
~100nA
5pA
~100nA
2.8nm
1.8nm
1.7nm
1.5nm
1000µm
1000um
500µm
500µm
Min 100µm square
Max (Option) 3000µm square
200MHz
0.1nm (at standard field)
8" (200mm) wafer / 12" (300mm) wafer (Option)
8" (200mm) square / 12" (300mm) square (Option)
Single autoloader
Multi autoloader
12" (300mm) FOUP robot loader
PEB robot loader
Elionix Lithography Management System
The elms software is a comprehensive electron beam lithography management user interface residing on a Win10 platform. From full production job scheduling, to SEM UI, to system diagnostics, this software platform is very intuitive to use.