ELS-Boden-E

ELS-BODEN Σ Series

Key Features:

  • The industry’s fastest high speed scanning system
  • Redesigned stage to meet the demands of production applications
  • Optimized for 300mm writing and wafer loading

HIGH PERFORMANCE 50KV LITHOGRAPHY SYSTEM

The ELS-BODEN  Sigma Series Systems was designed for high speed production environments.  This series offers a 400MHz high speed scan clock, which is 4 times faster than our standard products.  The electron beam lithography tools offer high current and narrow beam pitch.  The 150kV and 125kV systems are for ultra fine patterns, where the 100kV system is designed around the most common nanotechnological applications, while the 50kV tool is geared towards the highest possible speeds.

Specification

Electron Gun

Acceleration voltage

Beam current

Min. beam spot size

Writing field size

Min. / Max. field size

Scan clock

Min. beam position

Max. sample size

Max.writing area

Loading system

Software

ZrO/W Thermal Field Emitter

50kV

100kV

125kV

150kV

1nA
~1µA

20pA
~100nA

5pA
~100nA

5pA
~100nA

D5nm

D1.8nm

D1.7nm

D1.5nm

1000µm

1000um

500µm

500µm

Min 100µm square
Max (Option) 3000µm square

400MHz

0.1nm (at standard field)

8" (200mm) wafer / 12" (300mm) wafer

8" (200mm) square / 12" (300mm) square

Single autoloader
12" (300mm) FOUP robot loader
PEB robot loader

elms

Beam conditions
Exposure schedule
Pattern data converter
Account management
Python scripting

Elionix Lithography Management System

The elms software is a comprehensive electron beam lithography management user interface residing on a Win10 platform.  From full production job scheduling, to SEM UI, to system diagnostics, this software platform is very intuitive to use.