The ELS-ORCA offers cutting-edge performance on a customized platform for R&D applications. Various options can include automatic focusing, dynamic focus correction, and the flexibility to increase acceleration voltage up to 50kV. In addition, a high resolution SEM imaging option, with beam retarding capability, offers excellent observation at a low accelerating voltage. This allows the end-user to precisely calibrate the lithographic process against the CAD layout design, quickly and efficiently.
The elms software is a comprehensive electron beam lithography management user interface residing on a Win11 platform. From full production job scheduling, to SEM UI, to system diagnostics, this software platform is very intuitive to use.