ELF-10000

 

Key Features:

  • Largest beam current – 1uA
  • Fastest clock speed – 400MHz
  • Largest field size – 10mm square
  • Drastically reduces number of stitching boundaries

Surpassing conventional microfabrication systems in throughput

The ELF-10000 enables full 8-inch wafer size fabrications of nanoimprint molds within 24 hours. From production in nanoimprint technology to high-mix, low-volume production, the ELF-10000 is perfect for the large fabrication write fields of laser fabrication and machining fabrication.

Specification

Electron Gun

Acceleration voltage

Beam current

Min. beam spot size

Writing field size

Min. / Max. field size

Scan clock

Min. beam position

Max. sample size

Max.writing area

Loading system

Software

ZrO/W Thermal Field Emitter

50kV

100kV

125kV

150kV

1nA
~1µA

20pA
~100nA

5pA
~100nA

5pA
~100nA

D5nm

D1.8nm

D1.7nm

D1.5nm

1000µm

1000um

500µm

500µm

Min lOOµm square
Max (Option) 3000µm square

Max 200MH z

O.lnm (at standard field)

8" (200mm) wafer I 12" (300mm) wafer

8" (200mm) square I 12" (300mm) square

Single autoloader
Multi autoloader
12" (300mm ) FOUP robot loader
PEB robot loader

elms

Beam conditions
Exposure schedule
Pattern data converter
Account management
Python scripting

Inquries Form