ELF 10000
Print Friendly, PDF & Email
Download Brochure
Request ELMS Demonstration

ELF-10000

 

Key Features:

  • Largest beam current – 1uA
  • Fastest clock speed – 400MHz
  • Largest field size – 10mm square
  • Drastically reduces number of stitching boundaries

Surpassing conventional microfabrication systems in throughput

The ELF-10000 enables full 8-inch wafer size fabrications of nanoimprint molds within 24 hours. From production in nanoimprint technology to high-mix, low-volume production, the ELF-10000 is perfect for the large fabrication write fields of laser fabrication and machining fabrication.

Download Brochure 
Inquiries

Specification

Electron Gun

Acceleration voltage

Beam current

Min. beam spot size

Writing field size

Min. / Max. field size

Scan clock

Min. beam position

Max. sample size

Max.writing area

Loading system

Software

ZrO/W Thermal Field Emitter

50kV

100kV

125kV

150kV

1nA
~1µA

20pA
~100nA

5pA
~100nA

5pA
~100nA

D5nm

D1.8nm

D1.7nm

D1.5nm

1000µm

1000um

500µm

500µm

Min lOOµm square
Max (Option) 3000µm square

Max 200MH z

O.lnm (at standard field)

8" (200mm) wafer I 12" (300mm) wafer

8" (200mm) square I 12" (300mm) square

Single autoloader
Multi autoloader
12" (300mm ) FOUP robot loader
PEB robot loader

elms

elms-logo

Beam conditions
Exposure schedule
Pattern data converter
Account management
Python scripting

Related products

Inquries Form

  • *