1.5 nm beam diameter and minimum proximity effect at 150 kV
Wider process margin than 125 kV makes it easier to fabricate advanced nanodevices
Single cassette auto-loader that supports 8″ wafers is standard, multi-cassette auto-loader is optional
HIGH ACCELERATION VOLTAGE EBL SYSTEM
The ELS-F150 is the world’s first 150 kV electron beam lithography system. Expanding on the 100kV and 125kV systems, the ELS-F150 enables single-digit nanoscale device fabrication.
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