ELSS50EX
STS-Elionix | Direct Write Electron Beam Lithography (EBL) Syste
STS-Elionix | Direct Write Electron Beam Lithography (EBL) Syste
STS-Elionix | Direct Write Electron Beam Lithography (EBL) Syste
STS-Elionix | Direct Write Electron Beam Lithography (EBL) Syste
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ELS-S50EX

Key Features:

  • 10nm minimum line width
  • A 20bit DAC provides high beam positioning resolution
  • Automatic operating functions
  • Small Footprint

High Peformance 50kV Electron Beam Lithography System

The ELS-S50EX system delivers impressive resolution and minimal field stitching error. The system serves a wide variety of lithography applications e.g. electronic devices, optical devices, integrated circuits, MEMS parts and more. The system has a space-saving small footprint.

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Specification

Electron Gun

Acceleration voltage

Beam current

Min. beam spot size

Writing field size

Min. / Max. field size

Scan clock

Min. beam position

Max. sample size

Max.writing area

Loading system

Software

ZrO/W Thermal Field Emitter

50kV

100kV

125kV

150kV

1nA
~1µA

20pA
~100nA

5pA
~100nA

5pA
~100nA

D5nm

D1.8nm

D1.7nm

D1.5nm

1000µm

1000um

500µm

500µm

Min lOOµm square
Max (Option) 3000µm square

Max 200MH z

O.lnm (at standard field)

8" (200mm) wafer I 12" (300mm) wafer

8" (200mm) square I 12" (300mm) square

Single autoloader
Multi autoloader
12" (300mm ) FOUP robot loader
PEB robot loader

elms

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Beam conditions
Exposure schedule
Pattern data converter
Account management
Python scripting

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Inquries Form

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