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Reaching sub-micron scales unachievable via laser lithography. Designed for low volume device fabrication with minimal line edge roughness.
Reaching sub-micron scales unachievable via laser lithography. Designed for low volume device fabrication with minimal line edge roughness.
The ELF-10000 enables full 8-inch wafer size fabrications of nanoimprint molds within 24 hours. From production in nanoimprint technology, to high-mix, low-volume production, the ELF-10000 is perfect for the large fabrication write fields of laser fabrication and machining fabrication.
STS-Elionix is a partnership dedicated to delivering state-of-the-art nanotechnology products throughout North America and Europe.
