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Reaching sub-micron scales unachievable via laser lithography. Designed for low volume device fabrication with minimal line edge roughness.
Reaching sub-micron scales unachievable via laser lithography. Designed for low volume device fabrication with minimal line edge roughness.
The ELS-HAYATE enables full 8-inch wafer size fabrications of nanoimprint molds within hours. From high-mix to low-volume poduction, the ELS-HAYATE is perfect for large fabrication write fields where high throughput and ultra-fine pattern resolution is required.
STS-Elionix is a partnership dedicated to delivering state-of-the-art nanotechnology products throughout North America and Europe.
