The ELS-F150 is the world’s first 150 kV electron beam lithography system. Expanding on the 100kV and 125kV systems, the ELS – F150 enables single digit nanoscale device fabrication.
The ELS-BODEN Series Systems are dedicated to those customers seeking to fabricate devices where ultra-fine patterns are most important. The ELS-BODEN Series EBL tools offer up to a 300mm square writing area and can hold samples from small pieces up to 300mm wafers, as well as 9 inch masks. A complete line of autoloaders are available.
The ELS-G100 produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine patterns to be drawn with a line width of 6nm or less.
The ELS-S50EX system delivers impressive resolution and minimal field stitching error. The system serves a wide variety of lithography applications e.g. electronic devices, optical devices, integrated circuits, MEMS parts and
more. The system has a space saving small footprint.
STS-Elinox is a partnership dedicated to delivering state-of-the-art nanotechnology products throughout North America and Europe.