Research Tools



High acceleration voltage ebl system

The ELS-F150 is the world’s first 150 kV electron beam lithography system. Expanding on the 100kV and 125kV systems, the ELS – F150 enables single digit nanoscale device fabrication. 

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ELS-BODEN Series Tools

High performance Capabilities for High Resolution and High Throughput Applications

The ELS-BODEN Series Systems are dedicated to those customers seeking to fabricate devices where ultra-fine patterns are most important.  The ELS-BODEN Series EBL tools offer up to a 300mm square writing area and can hold samples from small pieces up to 300mm wafers, as well as 9 inch masks.  A complete line of autoloaders are available.

ELS-BODEN acceleration voltages are: 50kV, 100kV, 125kV, 150kV 



The ELS-G100 produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine patterns to be drawn with a line width of 6nm or less.



high performance 50kV electron beam lithography system

The ELS-S50EX system delivers impressive resolution and minimal field stitching error. The system serves a wide variety of lithography applications e.g. electronic devices, optical devices, integrated circuits, MEMS parts and
more. The system has a space saving small footprint.


Global Reach

STS-Elinox is a partnership dedicated to delivering state-of-the-art nanotechnology products throughout North America and Europe.

Elionix Lithography Management System

The elms software is a comprehensive electron beam lithography management user interface residing on a Win10 platform.  From full production job scheduling, to SEM UI, to system diagnostics, this software platform is very intuitive to use.

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