Halide perovskite materials have demonstrated superior optoelectronic properties for applications such as solar cells, LEDs, lasers, photodetectors, and more. However, these materials have been difficult to pattern at the nanoscale due to chemical incompatibility with conventional lithographic processes.
A new approach to overcome this issue has been recently reported using a bottom up approach to form nanocrystal arrays with deterministic control over size, position, and number. The technique makes use of a topographical template of controlled surface wettability in order to guide localized growth achieving dimensions and positioning below 50 nanometers. This technique opens ups new opportunities for extending perovskites’ applications to the nanoscale devices with arrays of nanoLEDs demonstrated in this work.
The work was performed in part at the MIT Research Laboratory of Electronics using an STS-Elionix ELS-F125 electron beam lithography system.
The work was recently reported by Patricia Jastrzebska-Perfect, Weikun Zhu, Mayuran Saravanapavanantham; Zheng Li, Sarah O. Spector, Roberto Brenes, Peter F. Satterthwaite, Rajeev J. Ram, and Farnaz Niroui of the Massachusetts Institute of Technology.
For more information see https://doi.org/10.1038/s41467-023-39488-0